Precision motion control in wafer stages

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High precision positioning and highly coordinated moves with tight IO synchronisation

Our wafer stages program has been designed for high precision motion control within the nanometer range. It is therefore ideal for wafer alignment, positioning and testing in the quality control phase.

The NYCe 4000 motion control system guarantees high precision with a 1 - 5 nm resolution as well as slow uniform motion ≥ 50 nm/s. Special servo motors and ironless linear and torque motors enhance dynamic performance. High-precision linear guides eliminate vibration. The addition of a pneumatic subsystem completes the automation package. Higher-order motion profiles and spline functions produce smoother motion sequences.

 

 

Powerful and open

Quiet and high dynamics

Ironless linear motors for wafer stage handling

Fast and smooth